Abstract
The results from investigations of TiN protective coatings formed on nanostructured cathode foil by means of plasma magnetron technologies and under irradiation by nitrogen plasma of a high-frequency inductive (HFI) discharge are presented. Their influence on the structure of coatings is demonstrated. Methods for controlling the ion energy and ion flux from an HFI plasma discharge onto a grounded substrate were studied. It was found that such regimes inevitably fail when uninsulated chamber walls and low working gas pressures are used.
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