Abstract
AbstractWe studied and characterized the processes of electroless nickel deposition in order to use it in microelectronics and microtechnology. We perform electroless nickel deposition on silicon surfaces with acid solution on palladium preactivated surfaces as well as alkaline solution without palladium preactivation. Electroless deposition was also performed on aluminum surfaces, deposited by evaporation onto silicon oxide. MOS capacitors were also fabricated to perform electrical characterizations of the structure (nickel‐aluminium‐oxide‐silicon) using capacitance‐voltage plots (C‐V curves). In addition, we also presented the use of electroless nickel deposition for chemical sensors which were fabricated using conventional microelectronics techniques. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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