Electrodynamic analysis of light-assisted subnano-polishing of a quartz surface under conditions of total internal reflection by using surface profile optimization

Abstract

The solution of the electrodynamic problem for determining the optimal configuration of the evanescent field formed near the rough quartz surface coated with an aqueous solution of sodium hypochlorite when illuminated from the side of quartz has been considered in order to ensure effective photochemical polishing of this surface to a sub-nanometer level of roughness. It was found that for a quartz surface profile in the form of triangular protrusions and troughs, which periodically repeat, the optimal conditions for photochemical polishing are achieved when the angle of incidence of light is critical and the height of the surface protrusions is small (up to 20 nm). It has been shown that in this case, the incident electromagnetic wave forms significantly higher values of the electric field in the protrusion region than in the trough region, creating optimal conditions for the subnano-polishing of this surface. Criteria are described for the possibility of using a regular profile in the form of protrusions and troughs of a triangular shape instead of a random surface profile characterized by a Gaussian correlation function when determining the optimal field parameters above the quartz surface.