Abstract
Si was electrodeposited potentiostatically on Ag substrates in molten LiF-NaF-KF mixed with various sized SiO2 particles at 873 K for 0.30-45 C cm-2. The electrodeposition mechanism of Si was focused on the addition of various sized SiO2 particles as starting materials: the average particles size of which were ca. 9.1 µm and ca. 0.80 µm. The cyclic voltammograms indicated that the dissolution rate or behavior of SiO2 in molten salt changed with the particles size of SiO2 powders. For using large sized SiO2 particles, growth process of dense c-Si film was observed, although the morphology of electrodeposited Si was rough for using small sized SiO2.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
