Electrodeposition of Ni-Se in a chloride electrolyte: An insight of diffusion and nucleation mechanisms

Abstract

NiSe layer with nanoparticles was electrodeposited from a chloride bath. The electrochemical mechanisms including the diffusion and nucleation mechanisms of NiSe were investigated by cyclic voltammograms and chronoamperometry techniques. It is noted that Se is more easily deposited on NiSe phase than Pt electrode. Both temperature and material of the electrode have significant effects on the electrochemical kinetics of NiSe electrodeposition, however the temperature does not change the progressive nucleation process and diffusion controlled growth mechanism of NiSe. The diffusion coefficient D of Ni and Se in NiSe system were calculated, and it increase with the increase of temperature, respectively. The compact NiSe layer with nanoparticles was electrodeposited on ITO glass at −0.9V and 40–60°C. Increasing the overpotential of the deposition makes NiSe layer more porous, however, there is no significant effect on the surface morphology of NiSe layer when the temperature is between 40 and 60°C.