Abstract
Co, CoNi and CoFeNi layers were formed on n-type silicon by electrodeposition method from sulfate solutions. The obtained films were characterized by Cyclic Voltammetry (CV), Scanning Electron Microscopy (SEM) and Energy Dispersive Spectrometry (EDS). The results show that the morphology and the stoechiometry of CoNi and CoNiFe deposits depend on several parameters (bath composition, applied potential…). The addition of sodium acetate as complexion agent in the bath leads to the formation of highly compacted and smooth films with a good adherence to the substrate.
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