Electrodeposition of As 2Se 3 thin films

Abstract

Semiconducting As 2Se 3 thin films have been prepared from an aqueous bath at room temperature onto stainless steel and fluorine-doped tin oxide (F.T.O.)-coated glass substrates using an electrodeposition technique. It has been found that As 2O 3 and SeO 2 in the volumetric proportion as 4:6 and their equimolar solutions of 0.075 M concentration forms good quality films of As 2Se 3. The films are annealed in a nitrogen atmosphere at temperature of 200 °C for 2 h. The films are characterised by scanning electron microscopy, X-ray diffraction and optical absorption techniques. Studies reveal that asdeposited and annealed thin films are polycrystalline in nature. The optical band gap has been found to be 2.15 eV for the above-mentioned composition and concentration of the film.