Electrodeposition of aluminum–hafnium alloy from the Lewis acidic aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt

Abstract

The electrochemistry of Hf(IV) and the electrodeposition of Al–Hf alloys were examined in the Lewis acidic 66.7–33.3 mol% aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt containing HfCl4. When cyclic staircase voltammetry was carried out at a platinum disk electrode in this melt, the deposition and stripping waves for Al shifted to negative and positive potentials, respectively, suggesting that aluminum stripping is more difficult due to the formation of Al–Hf alloys. Al–Hf alloy electrodeposits containing ~13 at.% Hf were obtained on Cu rotating wire and cylinder electrodes. The Hf content in the Al–Hf alloy deposits depended on the HfCl4 concentration in the melt, the electrodeposition temperature, and the applied current density. The deposits were composed of dense crystals and were completely chloride-free. The chloride-induced pitting corrosion potential of the resulting Al–Hf alloys was approximately +0.30 V against pure aluminum when the Hf content was above 10 at.%.