Abstract
AbstractElectrodeposition of noble metals (Pt, Pd, and Au) in ordered macropores prepared in p‐type Si under dark condition was investigated. Pt deposition proceeded continuously from the pore bottoms, and ordered micro‐rods were obtained. Pd deposition proceeded on the whole pore walls, and discontinuous micro‐tubes were obtained. Au deposition proceeded at 10‐20 μm depth from the pore openings where a high immersion plating rate was observed without applied potential, and short micro‐rods were obtained. At the pore bottoms a small amount of deposition was observed. The different behaviors of electrodeposition depending on the metals were compared and discussed. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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