Abstract
A magnetic material based on cobalt-nickel-rhenium-tungsten-phosphorus (Co-Ni-Re-W-P) composition has been developed by electrochemical deposition. With proper control of process conditions, hard magnetic films with high out-of-plane remanent magnetization (Mr) of 3.11 kG and coercivity (Hc) of 2.33 kOe are achieved. Fabrication of Co-Ni-Re-W-P in the form of microcylindrical arrays of /spl sim/50 /spl mu/m diameter and 90 /spl mu/m height enhances the vertical anisotropy to a vertical Mr of 5.15 kG and Hc of 2.02 kOe. The materials and fabrication technique of microstructures as reported could be applied for the fabrication of magnetic microelectromechanical systems.
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