Abstract
The results of a brief study of the origin and mode of formation of high resistance films on electrodes of demountable systems are presented. Evidence is given that the films are produced by the dissociation of organic molecules into radicals by electron bombardment and the polymerization of the latter. It is shown that, except where the partial pressure of organic molecules is 10-4 mm Hg or more, the process takes place in condensed layers of organic substances, that the nature of the electrode material is not important, and that a beam potential of a few volts is sufficient. Above 300V beam potential only a low resistance deposit is formed; no deposit is found if a temperature of 250°C or more is maintained. A qualitative comparison of the deposits originating from various vacuum seals in common use is described.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
