Abstract
Electrodepositing manganese oxide in a three-dimensional graphene architecture has barely been explored, and therefore an exploratory but systematic investigation was conducted. A series of manganese oxide/graphene hydrogel electrodes were prepared by galvanostatic technique. The effects of electrodeposition condition, including current density, deposition time, Mn2+concentration and bath temperature, on the morphology and capacitive performance of the deposits were investigated. Nucleation and growth processes of the deposited manganese oxide were then deduced. An optimal capacitance of 452.5 F g−1 was got. This study could provide insight into the crystallization mechanism for electrochemical preparation of MnOx/graphene electrode for advanced energy storage/conversion devices.
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