Abstract
A 48K “Apple” microcomputer programmed in machine language has been used to study simulation of electrocrystallisation. Applying an adapted Monte Corlo method, multilayer electrodeposition onto perfect, hexagonal close packed, surfaces has been simulated. It is shown that under diffusion independent conditions the shape of the computer generated current/time curve is dependent on the size of the lattice used in the simulation. When diffusion is allowed to become important in the simulation the deposit shows a dramatic change in morphology, with some clear parallels to observed deposits of cadmium.
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