Abstract
Titanium doped tungsten oxide (Ti:WO3) thin films with dendrite surface structures were grown by co-sputtering titanium and tungsten in Ar+O2 atmosphere. Ti:WO3 thin films were deposited at oxygen flow rates corresponding to pressures in the range 1.0×10−3–5.0×10−3mbar. Argon flow rate and sputtering power densities for titanium (2W/cm2) and tungsten (3W/cm2) were kept constant. Ti:WO3 films deposited at an oxygen pressure of 5×10−3mbar are found to be better electrochromic and photocatalytic. They have high optical modulation (80% at λ=550nm), coloration efficiency (60cm2/C at λ=550nm), electron/ion storage and removal capacity (Qc: −22.01mC/cm2, Qa: 17.72mC/cm2), reversibility (80%) and methylene blue decomposition rate (−1.38μmol/ld). The combined effects of titanium doping, dendrite surface structures and porosity leads to significant enhancement in the electrochromic and photocatalytic properties of Ti:WO3 films.
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