Abstract
Niobium oxide electrochromic thin films were prepared by reactive dc magnetron sputtering and their electrochromic properties for Li intercalation and durability were studied. Chronoamperometric analyses revealed that the extended space‐charge limited model by Zhang et al. is applicable to films. Crystallized films showed excellent electrochromism and stability over many coloration‐bleaching cycles. The best performance was obtained for films with a substrate temperature of 500°C and an oxygen flow rate of 10 sccm.
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