Electrochemistry of anodic fluorine gas evolution at carbon electrodes: Part II studies on the ?CF? film by the current-interruption, AC impedance, ESCA and auger techniques

Abstract

The ‘CF’ films that are formed on the surface of carbon anodes used for the fluorine evolution reaction (FER) in KF·2HF melts at 358 K have been studied by bothin situ electrochemical current-interruption and a.c. impedance methods, and byex situ surface spectroscopy [ESCA (XPS) and Auger] techniques. The surface analysis measurements indicate that a thin ‘CF’ (CF2) film, ∼1.7 nm in thickness is formed on the carbon anodesurface. Results from depth profiling analyses of the film indicate that it is not uniform, higher levels of CF and F components being found towards the carbon anode surface. Thein situ electrochemical measurements demonstrate that an abnormally small interfacial capacitance, ∼ (1.6–2.7)×10−7 F cm−2, arises in the course of the FER at carbon anodes; this was attributed to the presence of a passive dielectric ‘CF’ film on the carbon electrodes. The determined interfacial capacitance does not change significantly with potential in the potential range studied, which implies that the thickness of the ‘CF’ film on the fluorine-evolving carbon anodes may be independent of potential.