Electrochemically Induced Deposition (ECiD): A Versatile Method that Greatly Extends the Portfolio of Surface Coatings and Materials Fabricated by Electrochemical Deposition

Abstract

Electrochemically induced deposition or ECiD can be defined as the deposition of compound films on a surface, as the result of chemical reactions in the near surface region between a precursor present in the bulk solution and an electrochemically generated precursor, mediator, or catalyst near that surface. The ECiD process has evolved from an odd curiosity into a thriving new branch in electrodeposition science. The library of materials synthesized by ECiD has been greatly expanded, along with the number of precipitation triggering knobs or tricks. Together with the breadth of possibilities and applications, the science behind the process has also accelerated. This article introduces the principle of the ECiD process for the electrodeposition of oxides, hydroxides, and compounds such as metal phosphates and metal-organic frameworks. The article discusses the mechanisms of these electrochemically induced deposition reactions as well as the pro-bases used to trigger the deposition.