Electrochemical Passivation of (100) Silicon in Alkyl Grignard Solutions

Abstract

Surface modification of (100) silicon with methyl groups is analyzed using electrografting and thermal hydrosilation. The surface chemistry is investigated by Fourier transform infrared (FTIR), X-ray photoelectron spectroscopy (XPS), voltammetry and atomic force microscopy (AFM). Surfaces anodically electrografted in methyl Grignard solutions show a smooth topology and improved passivation relative to passivation via hydrosilation. Functionalized surfaces are stable and hinder the formation of oxides up to 45 days after the electrografting as shown in the XPS results.