Abstract
Electrochemical nitriding of a liquid phase tin metal has experimentally been confirmed by using the oxidation of nitride ions in molten LiCl–KCl–Li 3N melts according to the following reactions: N 3 − = N ads + 3 e − N ads + Sn = SnN x From the XPS analysis, N 1s signal and Sn 3d signals are observed, which corresponds to the formation of SnN x , after conducting argon ion sputtering for 1000 s. This showed that a thick and stable nitride film was formed by electrochemical nitriding.
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