Abstract
The local formation and dissolution of low‐dimensional phases and small clusters on foreign substrates plays an important role in modern nanotechnology. This paper deals with the current state of nanostructuring of semiconductor surfaces by localized electrochemical metal deposition using in situ scanning tunneling microscopy as a nano‐tool. New experimental results of delocalized and localized electrochemical deposition and dissolution of Pb on n‐type Si(111) single‐crystal surfaces are presented. The influence of surface inhomogeneities on the local metal deposition process is considered. © 1999 The Electrochemical Society. All rights reserved.
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