Abstract
The electrochemical growth of dithio-oxamido copper(II) (copper rubeanate, CuRA) films onto copper electrodes was investigated by voltammetric andin situ optical reflectance techniques and the photoelectrochemical behaviour of the deposits was examined. Copper oxide-free, adherent and uniform deposits are obtained in hydroalcoholic solutions of rubeanic acid by pottential steps from −0.9 to −0.75 Vvs sce up to thicknesses of several hundred manometers. Relatively high photoreduction currents (some % monochromatic quantum yield) are obtained. The presence of copper oxides chemically grown in the CuRA matrix greatly improves both the magnitude and the stability of photoresponses.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have