Abstract
An apatite layer was successfully formed on titanium substrates by electrochemical deposition under a pulse current in a metastable calcium phosphate solution, which had 1.5 times the ion concentrations of a normal simulated body fluid, but did not contain MgCl2·6H2O, at 40 °C for 30, 60, 90 and 120 minutes at the average current density of 10 mA/cm2. The thickness of the apatite layer was increased with increasing deposition time. The pulse-current deposition produced the thicker apatite layer than the direct-current deposition, and gave some effects on the surface morphology of the apatite. The pre-treatment using acid solution gave a better adhesive between apatite and substrate. It is expected that the present electrochemical deposition under a pulse current will be useful to rapidly coat apatite on metallic materials.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.