Abstract
Aluminium nitride films were deposited on glass and steel substrates, by reactive sputtering. Because stoichiometric aluminium nitride film deposited on glass substrates presents the highest electrochemical corrosion resistance, such a stoichiometric film was deposited on reactive substrates (steels). The porosity of the samples was determined using an electrochemical method, and corrosion tests were carried out in different solutions, using classic electrochemical techniques with direct and alternating currents. The porosity of aluminium nitride on metallic substrates was found to be inferior to 0.018 / 100. Despite the low thickness of the films (∼ 1 μm), an effective improvement of the corrosion resistance of stainless and mild steels was established, in H 2 SO 4 and NaCl solutions.
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