Abstract
Electrochemical behavior of titanium implanted with nickel and tantalum ions and a combination of the two has been investigated as a function of fluences. The polarization curves of the implanted titanium were potentiodynamically measured in the active and passive regions in a boiling 10 wt.% sulfuric acid solution. Electrochemical measurements revealed that nickel ion implantation significantly promoted the passivation of titanium with an increase of fluence and the corrosion potentials resided in the passive region at fluences above 1 × 10 16 ions/cm 2. Tantalum ion implantation was effective in reducing the anodic current densities in the active and passive regions as fluences increased. This effect was reduced at fluences above 7 × 10 16 ions/cm 2. At such fluences, the concentration of the implanted tantalum species decreased due to the etching effect of sputtering. On the other hand, the polarization curves of the co-implanted titanium exhibited more stable passive behavior with considerably low current densities. It was concluded that an excellent corrosion resistance of titanium was achieved by complementary effects of nickel and tantalum ion implantations.
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