Abstract
Model alloys, generated by magnetron sputtering, have been employed to understand the role of copper on the corrosion behavior of aluminum alloys. Binary Al–Cu alloys, with copper contents between 0 and 100 atom %, were synthesized with well-controlled compositions, embracing single-phase α and θ alloys together with multiphase alloys. Electrochemical measurements confirmed the stability of the thin alloy films and revealed that the corrosion behavior of the α, θ, and phases differed strongly in the cathodic region. Further, in the anodic region, phases of high copper content suffered pitting in sulfate solutions, while the α phase remained passive.
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