Abstract
Ni was activated by spontaneous deposition of Ru carried out in solutions of HCl containing RuCl 3. The occurrence of Ru deposition was confirmed by EDX and XPS and followed as a function of deposition time by cyclic voltammetry and Tafel lines for H 2 evolution in 1 mol dm −3 KOH. Experiments were performed by varying temperature, HCl as well as RuCl 3 concentration. The criticity of the presence of O 2 in solution was demonstrated. Ni activation by Ru is manifested by the appearance of H adsorption peaks in the voltammetric curve, and by the decrease of the Tafel slope for H 2 evolution from a 120 mV for bare Ni to ca. 40 mV.
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