Abstract
The instability of the commonly adopted support (e.g., Ti, Ti−Pd alloys, Ta) for the preparation and characterization of different electrode materials has been overcome by depositing the electrode material of interest (RuO2) on conductive, boron-doped diamond (BDD). The present paper reports results on the model chlorine evolution reaction, investigated at BDD surfaces modified by RuO2 loadings of 1.2 × 1013, 6.0 × 1014, and 2.65 × 1016 molecules cm-2. A radical spillover mechanism is proposed for the reaction occurring at the electrode having the lowest noble-metal oxide loading.
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