Abstract
Advances in Pulsed Laser Deposition (PLD) equipment and process design for the epitaxy of ZnO thin films on a-, and c-oriented sapphire substrates are reported. The achieved improvement of device relevant ZnO layer properties is directly related to our equipment design and novel process schemes. First results on growth and reflectivity of ZnO-MgO based dielectric Bragg resonators for future ZnO-based light emitter devices are shown.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
