Abstract
The Electro-optic properties of potassium niobate thin films deposited using a computer-controlled ion beam sputtering technique have been studied for the first time. Epitaxial and polycrystalline films were deposited on single crystal magnesium oxide and highly (111) oriented films were deposited on sapphire for the study. All films exhibited a quadratic-like dependence of birefringence shift on the applied electric field. The microstructure of the films and its relation to the observed electro-optic properties is discussed.
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