Abstract

Doped silicon nanoparticles have successfully been produced by hot wire thermal catalytic pyrolysis at 40 mbar and a filament temperature of 1800 °C, using a mixture of silane and diborane or phosphine. All particles are monocrystalline with shapes ranging from an octahedron to varying degrees of truncation of this basic shape, with an average diameter of 22 nm. To determine the doping activity, the resistivity of the nanopowders was measured at successive compression levels. While boron doped particles have clean surfaces and are electrically active, with compacted powder having a resistivity of the order of 10 3 Ω m, phosphorus doped particles are covered by an oxide layer whose thickness increases from 0.3 nm to 0.6 nm with higher phosphine concentrations. Furthermore, the phosphor atoms are localised at the interface to this surface layer, where they are electrically inactive. These powders have a resistivity in the order of 10 7 Ω m.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.