Abstract
To estimate the axial variation of resistivity in the silicon ingot directionally solidified with n-type UMG silicon material, the actual axial dopant concentration variations were measured and compared with simulated results. The simulation was conducted with segregation equations. It was found that the segregation coefficients (keff) of the doping impurities in this directional solidification were very close to the segregation coefficients of doping impurities in normal freezing (k0). With these segregation coefficients, the axial variation of resistivity was estimated with the PC1D program for various combinations of boron and phosphorous content in a silicon material. It was expected that the phosphorous content in the silicon material would be more determinative than the boron content in the enlargement of the useful portion of the silicon ingot for solar cell fabrication.
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