Abstract
Yttrium oxide (Y 2 0 3 ) has been successfully deposited on n-type 4H-SiC substrates using pulsed laser deposition. The effects of postdeposition annealing temperature (400, 500, and 600°C) on the electrical properties of the Y 2 O 3 gate oxide have been studied in comparison with the as-deposited sample. The sample annealed at 600°C possessed the highest dielectric breakdown field of ∼6.5 MV cm -1 at 10- 6 A cm -2 , resulting from the lowest interface trap density and total interface trap density. The Fowler-Nordheim tunneling mechanism has been investigated on all samples and the highest value of barrier height extracted between the semiconductor and oxide conduction band edges was 2.67 eV.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have