Abstract
Measurements have been made of the temperature dependences of the electrical resistivity and Hall coefficient in samples of n- and p-type silicon having impurity concentrations in the 1018 to 1020 cm−3 range. The resistivity data extend from 4° to 900°K, and the Hall data from 4° to 300°K. The results exhibit two noteworthy features: viz., (1) a hump or maximum in the resistivity vs temperature curves at or slightly below the degeneracy temperature in each sample, which is most pronounced in the least heavily doped samples and gradually fades out as the impurity concentration increases, and (2) an extension of the positive dependence of resistivity on temperature below the hump or degeneracy temperature to surprisingly low temperatures in each sample.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
