Abstract
Low resistivity, fluorine-doped tin dioxide thin films were deposited on glass substrates by spray pyrolysis. These films were prepared with different F-doping concentrations from 0 to 33 mol%. The structure of these films was investigated by X-ray diffraction and the surface morphology by Scanning Electron Microscopy. Sample compositions were evaluated using X-ray Photoemission Spectroscopy. According to these results, the films were all polycrystalline with tetragonal crystal structures. Hall measurements were used to probe the dependence of the resistivity on temperature for un-doped SnO2 and F-doped SnO2. The resistivity of un-doped SnO2 slightly increased with increasing temperature. Conversely, the resistivity of F-doped SnO2 slightly decreased with increasing temperature.
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