Electrical properties of FCVA deposited nano-crystalline graphitic carbon thin films with in situ treatment techniques

Abstract

In this report, detailed studies of the nano-crystalline graphitic (NCG) carbon thin films deposited by filtered cathodic vacuum arc (FCVA) following its first discovery and first electrical characterization have been performed. The microstructure of carbon thin film can be modified by applying in situ treatment techniques (such as altering the thermal and carbon ion deposition energy). It was found that highly electrical conductive carbon thin films with graphitic planes can also be deposited at a low deposition temperature instead of the previously reported high deposition temperature with a 20% improvement in electrical characteristic. The detailed electrical characterization comparison between amorphous carbon and NCG has been conducted. To conclude, NCG carbon can be fabricated at deposition temperature above 400 °C and exhibits increasing through film Ohmic electrical conductivity with increasing deposition temperature. At low temperatures, NCG carbon can be produced by increasing the negative substrate bias above 300 V (impinging carbon ion energy). Higher negative substrate bias leads to thinner amorphous interface layer hence better electrical conductivity.