Abstract
The influence of the pH and temperature of the electroless solution on the electrical characteristics of the deposited NiP thin films has been determined. The phosphorous content of the films increases when the pH of the solution is decreased giving rise to a diminution of the temperature coefficient of the resistance (TCR). Low TCR films (TCR ⩽ 100 ppm °C −1 are obtained for pH = 3.4. In this pH range the deposition rate can be increased by heating the electroless solution to moderate temperatures.
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