Abstract
The electrical and structural properties of flash-evaporated 70wt.%Cr- 30wt.%SiO cermet films were investigated. It was found that the electrical properties depend on the deposition conditions, thickness of the films, substrate roughness and post-deposition thermal treatment. Structural investigations were made in order to find the causes of variations in the electrical properties of films deposited and thermally treated in different conditions. The films produced were in the dielectric structural regime, with concentrations of chromium equal to or less than 40 vol.%. The temperature coefficient of resistance was from -30 to -200 ppm °C -1 and the sheet resistivity was from 200 to 1400Ω/□. The concentration and distribution of chromium, which vary with the deposition conditions, have the strongest influence on the electrical properties of the thin films.
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