Electrical Probe Diagnostics of the Hollow Cathode Plasma Jet System for Deposition of TiOx Thin Films

Abstract

AbstractMeasurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies. Pulsed DC bias, middle frequency 500 kHz bias, and pulse‐modulated 13.56 MHz RF bias were compared. The measurements were performed for different bias and discharge conditions. Time‐resolved Langmuir probe technique was simultaneously used to observe the basic plasma properties during the ion flux measurements. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)