Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics

Abstract

This work investigates the performance and gate bias stress instability of ZnO-based thin film transistors (ZnO-TFTs) incorporating amorphous gadolinium oxide, a high-k dielectric material. ZnO thin films produced via radio frequency (RF) reactive magnetron sputtering were used as channel layers. The source/drain electrodes were achieved by the thermal evaporation of aluminium on a bottom gate inverted staggered ZnO TFT structure. Gadolinium oxide (Gd 2 O 3 ) deposited by metal-organic chemical vapour deposition (MOCVD) served as the gate dielectric. The electrical characterisation of the ZnO-TFTs produced showed improvement in performance and stability in comparison to thermally-grown SiO 2 -based ZnO TFTs fabricated under the same conditions. The effective channel mobility, on-off current ratio and subthreshold swing of the TFTs incorporating Gd 2 O 3 dielectric were found to be 33.5 cm 2 V -1 s -1 , 10 7 , and 2.4 V/dec respectively when produced. The electrical characterisation of the same devices produced with SiO2 dielectrics exhibited effective mobility, on-off current ratio and subthreshold swing of 7.0 cm2 V -1 s -1 , 10 6 and 1.4 V/dec respectively. It is worth noting that, the ZnO active layer was sputtered under room temperature with no intentional heating and post-deposition annealing treatment. On application of gate bias stressing on these thin film transistors, it was observed that threshold voltage instability increased with stress period in all device types. Transistors incorporating Gd 2 O 3 however, were found to exhibit lesser threshold voltage related instability with regards to gate bias stressing in comparison to similar devices incorporating SiO 2 as gate dielectric. It was also observed that the effective mobility in both devices tend to stabilize with prolonged gate bias application. In this work, it is demonstrated that Gd 2 O 3 dielectric is a potential alternative to SiO 2 for the fabrication of ZnO TFTs with improved performance and electrical stability under prolonged use.