Abstract
ZnO:Al (AZO) films were prepared by radio frequency (RF) magnetron sputtering at various RF power (70-200W), the electrical and optical properties of AZO films were first investigated. The films deposited at 170W and 200W had the optimum opto-electrical property and then were surface textured by a post-deposition chemical etching with 0.5% HCl for 10-30s, all these films developed a craterlike surface morphology and the crater became larger and deeper as the etching time was increased. The light scattering property of AZO films was researched by calculated spectral haze. The AZO film deposited at 170W and etched 30s had the optimal light scattering property due to its most suitable craterlike surface morphology. Introduction
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