Abstract
In this evaluation, aluminum oxide layers with thicknesses in the range of 300 nm to 4000 nm are investigated for their electrical insulation capability by measuring the resistance between the substrate and a subsequent conductive layer. The deposition was carried out in a non-reactive RF magnetron sputtering process and in a reactive HiPIMS process, respectively. The substrate materials tested are steel 1.3505 (100Cr6), titanium alloy 3.7164 (Ti6Al4V) and aluminum alloy 3.1645 (AlCuMgPb) with both turned and polished surfaces.Besides resistance measurements, the layers were investigated by SEM and characterized by EDX. During the HiPIMS deposition, the value of the electrical current over the time of one pulse was measured additionally.The comparison of the resistance values showed strong dependencies between the electrical insulation and the substrate materials used, as well as their surface microstructure. Moreover, a deviating insulation performance for the layers deposited by HiPIMS was identified. From the results, a correlation of substrate material, surface microstructure and the corresponding deposition technology is deduced.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
