Electrical Contacts to Nanomaterials.

Abstract

The efficient passage of electrical current from an external contact to a nanomaterial is necessary for harnessing characteristics unique to the nanoscale, such as those relevant to energy quantization. However, an intrinsic resistance pertinent to dimensionality crossover and the presence of impurities precludes optimal electrical contact formation. In this review, we first discuss the relevant principles and contact resistance measurement methodologies, with modifications necessary for the nanoscale. Aspects related to the deposition of the contact material are deemed to be crucial. Consequently, the use of focused ion beam (FIB) based deposition, which relies on the ion-induced decomposition of a metallorganic precursor, and which has been frequently utilized for nanoscale contacts is considered in detail.