Abstract
This paper presents our investigation in characterization of thin films of lead magnesium niobate—lead titanate (PMNT). We deposited films by rf magnetron sputtering on platinized silicon. As-deposited films are annealed and electrical characterizations are performed with platinum top electrode. We present capacitance—voltage, current—field and permittivity versus thickness characteristics. These are analyzed in the view of structural and microstructural observations.Our primary aim in this work being the development of integrated capacitors, we draw some conclusions and future directions of study in the frame of this application.
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