Abstract
The evaporation of gold onto SiN or SiOx leads to the formation of nanoscale islands separated by tunneling barriers. As the deposited thickness of Au increases, there is a linear increase in island size and an exponential decrease in film resistance, resulting from coalescence of neighboring islands. This understanding of film morphology allows the construction of a simple model of film resistivity. The model also accounts for the exponential decrease of resistance observed during deposition of Pd nanoparticles onto Au island films. The results suggest the use of discontinuous Au island films as a sensitive way of controlling nanoparticle deposition.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
