Abstract
The Schottky barrier heights of molybdenum (Mo) on n-GaN were investigated as a function of annealing temperature by current–voltage ( I– V) and capacitance–voltage ( C– V) techniques. The Schottky barrier height of the as-deposited Mo/n-GaN was found to be 0.81 eV ( I– V) and 1.02 eV ( C– V), respectively. However, both measurements indicate that the barrier height slightly decreases upon annealing at 400 °C for 1 min in nitrogen ambient. The barrier height of Mo/n-GaN Schottky contacts at 400 °C was determined to be 0.74 and 0.92 eV, respectively. Further, an increase in annealing temperature up to 600 °C, decreased the barrier height to 0.56 and 0.73 eV. The Mo Schottky contact was also shown to be fairly stable during annealing at 400 °C.
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