Abstract
The structure of the microgap and the manufacturing processes for a new type of microgap surge absorber, fabricated by semiconductor technology, are described. A very stable spark-over voltage with a narrow distribution was obtained by coating the metallic films in the microgap. As well as the desirable characteristics of common microgap surge absorbers, this new type of microgap surge absorber has other advantages such as small size, low cost and suitability for mass production.
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