Abstract
A study of the effect of the substrate bias potential on the electrical properties of CH 4/H 2 discharges used for depositing a-C:H thin films on polymeric substrates was performed. Accurate measurements of the rf power and impedance based on recording voltage and current waveforms were applied for the determination of the effect of substrate bias. In addition, spatially resolved emission spectroscopy was utilized for following the effect of bias on the spatial production of species. The results show an increase of the total discharge power consumption and the production of species with the bias voltage. It is shown that apart from modifying ion bombardment, substrate biasing leads at the same time to significant changes in the discharge structure and the density of film precursors.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
