Abstract
ABSTRACTElectrochemical impedance in H2SO4solutions and kinetics of redox reactions in the Fe(CN)63-/4-system were studied on amorphous nitrogenated diamond-like carbon (a-C:N:H) thin-film electrodes. Parameters of point defects (trapping centers) were also measured by the Deep Level Transient Spectroscopy techniques. The films have been fabricated onp- andi-type silicon and quartz substrates, using direct ion beam deposition from an RF inductively coupled N2+ CH4plasma source. The increase in N2/CH4ratio in the gas mixture lead to a decrease in the electrical resistivity and optical bandgap of the films from 3×1010to 5×106Ω cm and from 1.3 to 0.6 eV, respectively. Simultaneously, the concentration of electrically active point defects increased significantly and the charge transfer at the a-C:N:H film/redox electrolyte interface was facilitated
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