Abstract
Ti5Si3 thin films were coated on glass substrate by atmospheric pressure chemical vapor deposition method at different temperatures. Electrical and corrosion properties of the thin films were investigated. The results show that the electrical resistivity of the thin films decreases initially with the increase in deposition temperature. However, it increases with the further increase of the temperature. The lowest electrical resistivity of 107μΩ⋅cm is obtained at 710°C. The least corrosion rates of the thin films at 95°C of 0.10nm/min and 0.13nm/min in 1N and 10N acid solution and of 0.33nm/min and 6.55nm/min in 1N and 10N alkali solution, respectively, are obtained by weight-loss measurement method. The corrosion mechanisms of the thin films were also discussed in detail.
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