Abstract
Nanoindentation has been utilised in order to investigate the mechanical properties of low-temperature (50-300°C) plasma-deposited SiNx thin films for applications of micro-electro-mechanical systems on temperature sensitive, non-standard substrates. It is found that films deposited at higher temperatures are suitable for these applications, in contrast to films deposited at lower temperatures which tend to have much lower values of Young's modulus and hardness, as well as exhibit significant surface roughness, porosity, and creep. The correlation of SiNx mechanical properties with deposition temperature is shown to be associated with thin film atomic composition and details of the deposition process.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: International Journal of Surface Science and Engineering
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
